We demonstrate ultrathin body (UTB) high mobility InAsSb-on-insulator (XOI) n-FETs. The devices are obtained by the epitaxial layer transfer (ELT) of ultrathin InAsSb layers (thickness, 7-17 nm) onto Si/SiO2 substrates. InAsSb XOI FETs exhibit a peak effective mobility of ~5000 cm2/V-s and an ION/IOFF ratio of over 104. The top-gated devices exhibit an impressive ION of ~0.24 mA/Î¼m (LG~500 nm) at VDD=0.5 V and a SS of ~109 mV/dec. These results demonstrate the utility of the XOI platform for obtaining high mobility n-FETs on Si by using mixed anion arsenide-antimonide as the active channel material.
Project end date: 08/18/11