BPN501: Patterned Contact Printing with Monolayer for Aligned Nanowire Arrays


Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers (SAM) as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer-resist in an oxygen rich environment, sticky and non-sticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions, and demonstrates the versatility of molecular monolayers for use as a resist layer.

Project end date: 01/25/10

Publication date: 
January 23, 2010
Publication type: 
BSAC Project Materials (Final/Archive)
PREPUBLICATION DATA - ©University of California 2010

*Only registered BSAC Industrial Members may view project materials & publications. Click here to request member-only access.