RTH35: Novel SiGe Processes for Electrostatically Actuated MEMS Resonators


As an alternative material for surface micromachining, polycrystalline silicon-germanium (poly-SiGe) has comparable processes and material properties to polycrystalline silicon (poly-Si). Its low processing temperature is the major advantage of poly-SiGe as it enables post-CMOS integration of MEMS. This modular approach to MEMS integration is an attractive route to higher performance and lower cost microsystems.

Project end date: 01/24/07

Publication date: 
August 23, 2006
Publication type: 
BSAC Project Materials (Final/Archive)
PREPUBLICATION DATA - ©University of California 2006

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