Prof. Hayden Taylor School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore
October 23, 2012 | 12:00 to 01:00 | 540 Cory Hall, DOP Center Conference Room Host: Kameshwar Poolla
Nanoimprint lithography (NIL) offers sub-10 nm patterning resolution with lower capital costs than competing technologies. To be adopted widely in data storage and semiconductor manufacturing, however, NIL’s throughput needs to increase and its defect rate needs to fall. One way of improving NIL’s throughput and yield is to develop...