BPN410: Endeavor AT Aluminum Nitride Deposition Process Characterization


A new cluster tool system, the Endeavor AT, was recently installed and characterized in the Marvell Nanolab. The system was donated by Analog Devices, and consists of three physical vapor deposition chambers for molybdenum sputtering, piezoelectric aluminum nitride sputtering, and aluminum sputtering respectively. The AlN process was thoroughly characterized with response surface design and factorial design of experiments. The AlN process has been released for general labmember use. The results of the process characterization are presented here.

Project end date: 01/13/11

Matthew Wasilik
Publication date: 
August 12, 2010
Publication type: 
BSAC Project Materials (Final/Archive)
PREPUBLICATION DATA - ©University of California 2010

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