Dr. Christophe Peroz
aBeam Technologies, Lawrence Berkeley National Laboratory Molecular Foundry
February 18, 2014 | 12:30 to 01:30 | 540 Cory Hall
Host: Paul Lum
Nanoimprint Lithography (NIL) offers unique opportunities for cost-effective fabrication of photonic devices with micro/nanometer features. Over the last six years, we have pushed the limits (e.g., resolution, materials, robustness) of the NIL techniques and opened the route for new applications. I will present a novel Step-and-Repeat NIL process on pre-spin coating films and will discuss its performance and limitations. The process was used to fabricate and transfer the smallest structures (sub-10nm) ever reported by NIL and replicate a full-integrated photonic circuit. As one step further, we will introduce a powerful approach for fabricating devices by directly imprinting functional materials without need for plasma etching. Based on a unique functional titania-based resist material, the first printable photonic devices with a high refractive index (n>2) for visible light were recently demonstrated. A discussion will be opened on the perspectives offered by NIL techniques on the campus of LBNL and UC Berkeley.
abeamtech.com
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