Mischa Megens
BSAC Staff Engineer
February 2, 2010 | 12:00 to 01:00 | 521 Cory Hall, Hogan Room
Host: Bernhard Boser
Photonic crystal structures are well known for their capacity to influence spontaneous emission, and it has been suggested that such structures could enhance efficiency and beam shaping of LEDs. To achieve such improvements, GaN PXLEDs have been made at Philips LumiLEDs in an effort to measure, understand and accurately predict their emission patterns. Successful application of such technology requires a method to fabricate photonic crystal structures on LED wafers cost-effectively. Nanoimprint lithography (NIL) has attracted considerable attention for this purpose due to its high resolution, high throughput and low cost of ownership. However, current NIL techniques with rigid stamps rely on substrate flatness, and imprinting with flexible stamps suffers from resolution loss due to stamp distortion caused by imprint pressure. A novel NIL technique developed at Philips Research addresses these issues; it is named Substrate Conformal Imprint Lithography, or SCIL. The imprint process uses a soft rubber stamp in combination with an inorganic imprint resist. This is a unique combination that allows patterning of features from millimeter to deep sub-micron. The SCIL process can be used on substrates that are bowed, rough and even on finished devices. It is now commercially available from Suss MicroTec.
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