BSAC Seminar: µSpectrometer - Design Process and Simulation

October 28, 2014

Romain Mahieu

CEA-Leti, MINATEC Campus, Grenoble, France
October 28, 2014 | 01:00 to 01:30 | 540 Cory Hall
Host: John Huggins

The first generation of µSpectrometer’s based on silicon microfabrication that have already been fabricated are based on TOF principle. However, this has proven to be very restrictive in terms of high vacuum and high speed detection systems due to high sensitivity. Therefore the second generation was design to investigate alternative structures in order to reduce the constraints on instrumentation. This last generation was simulated and then the mask set for the microfabrication was prepared with use of a home-made conversion program that improved the time to fab delay. Moreover based on the experience gathered in previous work, new web-based simulation software was prepared. The aim of this software is to enhance the design of the future µSpectrometer generations. 

www.cea.frwww.cea.fr/technologies/micro-and-nanotechnologies

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